Nicolas Forrer (2020-2024)
Germanium/Silicon Nanowire Heterostructures for Quantum Computing
In the first part of this work, a detailed study on the growth kinetics of silicon and germanium nanowires, employing the vapour-liquid-solid growth method catalysed by gold, is presented. The effects of temperature, partial pressure, and carrier gas for different precursor gases on the nanowires’ growth kinetics and structural properties are evaluated by means of scanning electron microscopy. Here, it was found that argon as carrier gas enhances the growth rate at higher temperatures, while hydrogen does so at lower temperatures, due to the lower heat flux. For both precursor gases two growth regimes as a function of temperature were found. The tapering rate of the silicon nanowires is about an order of magnitude lower than the one of germanium nanowires. Furthermore, optimal conditions for NWs nucleation have been identified for both materials. Different catalyst deposition techniques have been investigated, namely electron beam lithography and colloidal deposition. Here, the colloidal deposition shows high ease of usage and high control over the size, while lacking the freedom of choosing different materials or a precise control over position and density. This freedom is given by the lithography approach, though its optimisation requires more effort. In the pre-growth preparation, hydrofluoric acid is often employed to enable epitaxial growth. Different hydrofluoric acid concentrations have been tested to find an optimal one around 2%. Germanium buffered substrates are a way to reduce the usage of hydrofluoric acid, making the process safer.
In the second part germanium-silicon core-shell nanowires were grown employing chemical vapour deposition techniques. Thereby, a two-step growth procedure for the growth of germanium core is introduced and optimised for optimal crystal quality and low tapering rates. An optimal temperature of 350 °C for nucleation and a lower temperature of 280 °C for the elongation of the wires has been found. The change of temperature worked best for growth total pressure of 1Torr and 2Torr, while the gas mixture used during the whole growth is germane 10% in argon. Approaches have been tested to deposit thermal silicon shells. Several recipes were tried, most of them leading to no shell growth. Therefore, efforts have been made to deposit the silicon shell at low temperature (250 °C) by a plasma enhanced reaction. This lead to high control over the thickness of a crystalline silicon shell, with a growth rate of about 1.8nmmin−1. Raman measurements of germanium-silicon core-shell nanowires revealed a compressive strain in the germanium core, which increases with increasing shell thickness. Furthermore, high resolution transmission electron microscopy proved the crystal direction to be ⟨110⟩ and (poly- or single) crystallinity.
Other germanium-silicon heterostructures were grown, namely curved germanium quantum wells and axial silicon barriers. Two growth procedures for curved germanium quantum wells have been tested and optimised, one employing the plasma, the other thermal deposition. It was observed that with the plasma enhanced deposition the pressure influences the growth rate of the shell much more than the plasma power. Thermal shell deposition of germanium was also reached, leading to symmetric and homogeneous shells. First experiments on axial silicon barriers have been conducted. It was found that the transition from germanium to silicon works very well, while the reversed transition is more challenging due to the different saturation levels of silicon and germanium in gold.